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dc.contributor.author이동헌-
dc.contributor.author조용수-
dc.contributor.author이월인-
dc.contributor.author이전국-
dc.contributor.author정형진-
dc.date.accessioned2015-12-02T03:00:18Z-
dc.date.available2015-12-02T03:00:18Z-
dc.date.issued199401-
dc.identifier.citationVOL 31, NO 12, 1577-1587-
dc.identifier.other3629-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/8171-
dc.publisher한국요업학회지-
dc.subjectMOCVD-
dc.subjectTiO2-
dc.subject질소치환-
dc.titleCharacterization of nitrogen-doped TiO2 thin films prepared by metalorganic chemical vapor deposition-
dc.typeArticle-
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