Perpendicular Orientation of Block Copolymer Thin Films Using Various Treatments

Authors
Son, Jeong Gon
Issue Date
2005-05-30
Publisher
NANO Systems Institute (NSI)
Citation
The 1st International Workshop of NANO Systems Institute (IW-NSI)
URI
https://pubs.kist.re.kr/handle/201004/82041
Appears in Collections:
KIST Conference Paper > 2005
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