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Catalytic chain length and characteristic curve in a chemical amplification photoresist using sulfonate photoacid generator.

Title: Catalytic chain length and characteristic curve in a chemical amplification photoresist using sulfonate photoacid generator.

Authors: 안광덕; 양승관; 박찬언

Keywords: catalytic chain length; deep UV photoresists; photoacid generator; pyrogallol tris(methane sulfonate); t-BOC-protected phosphazene; dissolution inhibition; chemical amplification resist

Issue Date: 1993-05

Publisher: 폴리머; Polymer

Citation: v. 17, no. 3, 335-340

URI: https://pubs.kist.re.kr/handle/201004/8205

Appears in Collections:: KIST Publication > Article

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