DSpace at KISTKIST Patent2001

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dc.contributor.author서용석-
dc.contributor.author김광웅-
dc.contributor.author홍성욱-
dc.contributor.author황승상-
dc.contributor.author홍순만-
dc.date.accessioned2024-01-12T08:38:26Z-
dc.date.available2024-01-12T08:38:26Z-
dc.date.issued2003-02-11-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/82338-
dc.title형태학적　조절을　이용한　고성능　선택투과성을　가지는　열방성　액정고분자　복합　기체분리막-
dc.typePatent-
dc.date.registration2003-02-11-
dc.date.application2001-06-21-
dc.identifier.patentRegistrationNumber6,517,606-
dc.identifier.patentApplicationNumber09/886,604-
dc.publisher.countryUS-
dc.type.iprs특허-
dc.contributor.assignee한국과학기술연구원-
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KIST Patent > 2001
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