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Measurement of particle deposition velocity toward a horizontal semiconductor wafer using a wafer surface scanner.

Title: Measurement of particle deposition velocity toward a horizontal semiconductor wafer using a wafer surface scanner.

Authors: 배귀남; 박승오; 이춘식; 명현국; 신흥태

Keywords: particle deposition velocity; 입자의 침착속도; semiconductor wafer; 반도체 웨이퍼; convection; 대류; diffusion; 확산; sedimentation; 중력침강

Issue Date: 1993-01

Publisher: 공기조화·냉동공학 논문집

Citation: VOL 제 5 권, 130-140

URI: https://pubs.kist.re.kr/handle/201004/8243

Appears in Collections:: KIST Publication > Article

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