금속이온 이용 무전해 에칭법에 의한 다발구조의 실리콘 나노로드 제조방법 및 이를 함유하는 리튬이차전지용 음극 활물질

Author
이중기조병원우주만박상은정경윤장원영김상옥김형선
Assignee
한국과학기술연구원
Regitration Date
2012-01-02
Registration No.
10-1103841
Application Date
2009-05-27
Application No.
2009-0046373
Country
KO
URI
https://pubs.kist.re.kr/handle/201004/84004
Appears in Collections:
KIST Patent > 2009
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