A new chemical amplification resist system based on novolac and t-BOC protected phosphazene as a dissolution inhibitor.
- A new chemical amplification resist system based on novolac and t-BOC protected phosphazene as a dissolution inhibitor.
- 안광덕; 강종희; 김성주; 박병선; 박찬언; 박춘근
- three component positive resist materials; deep UV resists; dry etch resistance; chemical amplification resists; dissolution inhibition resist; t-BOC protected phosphazene; novolac resin; photosensitivity
- Issue Date
- Journal of photopolymer science and technology
- v. 5, no. 1, 67-78
- Appears in Collections:
- KIST Publication > Article
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