A new chemical amplification resist system based on novolac and t-BOC protected phosphazene as a dissolution inhibitor.
- Title
- A new chemical amplification resist system based on novolac and t-BOC protected phosphazene as a dissolution inhibitor.
- Keywords
- three component positive resist materials; deep UV resists; dry etch resistance; chemical amplification resists; dissolution inhibition resist; t-BOC protected phosphazene; novolac resin; photosensitivity
- Issue Date
- 1992-01
- Publisher
- Journal of photopolymer science and technology
- Citation
- v. 5, no. 1, 67-78
- Appears in Collections:
- KIST Publication > Article
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