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dc.contributor.author안광덕-
dc.contributor.author구덕일-
dc.contributor.author김승주-
dc.date.accessioned2015-12-02T03:03:26Z-
dc.date.available2015-12-02T03:03:26Z-
dc.date.issued199101-
dc.identifier.citationv. 4, no. 3, 433-443-
dc.identifier.other2006-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/8545-
dc.publisherJournal of photopolymer science and technology-
dc.subjectt-BOC-
dc.subjectprotected maleimide polymers-
dc.subjectt-BOC-maleimide thermally stable resist materials-
dc.subjectdeep UV resist materials-
dc.subjectchemical amplification resists-
dc.subjectdeprotection of polymers-
dc.subjectN-[(t-BOC)-oxyphenyl] maleimide-
dc.subjectreactive ion etch resistance-
dc.titlet-BOC maleimide copolymers for thermally stable deep UV resists by chemical amplification.-
dc.typeArticle-
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