Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Choi, Won Jun | - |
| dc.contributor.author | Lee, Seok | - |
| dc.date.accessioned | 2024-01-12T11:41:31Z | - |
| dc.date.available | 2024-01-12T11:41:31Z | - |
| dc.date.created | 2022-01-14 | - |
| dc.date.issued | 1994-01-01 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/86037 | - |
| dc.title | Quantum well disordering by using plasma enhanced chemical vapor deposited SiNx film as a capping layer | - |
| dc.type | Conference | - |
| dc.description.journalClass | 1 | - |
| dc.identifier.bibliographicCitation | China, pp.0 | - |
| dc.citation.title | China | - |
| dc.citation.startPage | 0 | - |
| dc.citation.endPage | 0 | - |
| dc.relation.isPartOf | 1st Korea-Chinese semiconductor conference - 직접입력 | - |
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