KIST Library Institutional Repository

금속이온 투과방지층을 함유한 고이온선택성 복합 고분자 전해질막 제조 기술 및 이를 이용한 레독스플로우 전지

Author

안지훈; 쉬라즈; 하흥용

Assignee

한국과학기술연구원

Regitration Date

2020-12-04

Registration No.

10-2189857

Application Date

2018-11-23

Application No.

10-2018-0146479

Country

KO

URI

https://pubs.kist.re.kr/handle/201004/88654

Appears in Collections:

KIST Patent > 2018

Files in This Item:

There are no files associated with this item.

Export

RIS (EndNote)

XLS (Excel)

XML