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CSM(Coherent Scattering Microscope) system development for next generation EUV photomask inspection

Other Titles

차세대 EUV 반도체 포토마스크 검사를 위한 CSM(Coherent Scattering Microscope) 시스템 개발

Authors

박한용; 김용수; 성하민; 김점술; 이승범; 조현우; 이주한; Kim, Yong Tae; Jhon, Young Min

Publisher

4.6~8, 코엑스, 한국광학회

Citation

차세대 리소그래피 학술대회, no.F2-IV-2, pp.119 - 120

Keywords

EUV; CSM

URI

https://pubs.kist.re.kr/handle/201004/89318

Appears in Collections:

KIST Conference Paper > Others

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