스트레인이 완화된 실리콘-게르마늄 버퍼층 제작 방법 및 그 장치

Author
한승희김성민신상범이근혁김경훈
Assignee
한국과학기술연구원
Regitration Date
2015-03-10
Registration No.
10-1503000
Application Date
2013-10-21
Application No.
10-2013-0125355
Country
KO
URI
https://pubs.kist.re.kr/handle/201004/89600
Appears in Collections:
KIST Patent > 2013
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