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dc.contributor.authorJhon, Young Min-
dc.contributor.authorKim Yong Soo-
dc.contributor.authorAhn Joonmo-
dc.contributor.authorLee, Ju han-
dc.contributor.authorSung, Hamin-
dc.contributor.authorKim, Jomsool-
dc.contributor.author이승범-
dc.contributor.author조현우-
dc.contributor.authorPark, Min-Chul-
dc.contributor.authorCho, Woon Jo-
dc.contributor.authorKim, Yong Tae-
dc.date.accessioned2024-01-12T16:04:53Z-
dc.date.available2024-01-12T16:04:53Z-
dc.date.created2021-09-29-
dc.identifier.urihttps://pubs.kist.re.kr/handle/201004/91104-
dc.languageEnglish-
dc.subjectCoherent Scattering Microscopy-
dc.subjectMask Inspection-
dc.subjectEUV-
dc.titleDevelopment of Coherent Scattering Microscopy Mask Inspection System using a Coherent EUV Light Source-
dc.title.alternative결맞는 극자외선 광원을 이용한 CSM 마스크 검사장비 개발-
dc.typeConference-
dc.description.journalClass2-
dc.identifier.bibliographicCitation차세대 리소그래피 학술대회, pp.148 - 149-
dc.citation.title차세대 리소그래피 학술대회-
dc.citation.startPage148-
dc.citation.endPage149-
dc.citation.conferencePlaceKO-
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