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Coherent scattering stereoscopic microscopy for mask inspection of extreme ultra-violet lithography

Authors

Kim Ki Hyuk; Cho Jung-gyn; Park, Min-Chul; Ju, Byeong-Kwon; Cho Sung-jin; Son, Jung-Young

Citation

SPIE Defense Security and Sensing

Keywords

extreme ultraviolet lithography; mask inspection; stereoscopic; microscopy

URI

https://pubs.kist.re.kr/handle/201004/93957

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KIST Conference Paper > Others

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