Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | JONG-KEUK, PARK | - |
| dc.contributor.author | LeeJungHoon | - |
| dc.contributor.author | Lee, Wook Seong | - |
| dc.contributor.author | Baik, Young Joon | - |
| dc.date.accessioned | 2024-01-12T18:35:56Z | - |
| dc.date.available | 2024-01-12T18:35:56Z | - |
| dc.date.created | 2021-09-29 | - |
| dc.identifier.uri | https://pubs.kist.re.kr/handle/201004/93976 | - |
| dc.language | English | - |
| dc.title | Effect of Substrate Bias and Hydrogen Addition on the Residual Stress of Hexagonal Boron Nitride Film Prepared by Sputtering of B4C Target with Ar/N2 Reactive Gas | - |
| dc.type | Conference | - |
| dc.description.journalClass | 1 | - |
| dc.identifier.bibliographicCitation | ICMCTF2013 | - |
| dc.citation.title | ICMCTF2013 | - |
| dc.citation.conferencePlace | US | - |
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