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Electrochemical characteristics of plasma treated materials for a high response rate as transparent electrochromic devices

Authors

Kim A Young; Chairul Hudaya; Park Ji Hun; CHOI, WONCHANG; 변동진; Lee, Joong Kee

Citation

IUMRS-ICA 2012

Keywords

ECR-MOCVD; Elctrochromic device; FTO and Plasma treatment; ECDs

URI

https://pubs.kist.re.kr/handle/201004/95574

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KIST Conference Paper > Others

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