DSpace at KIST: Establishment of optimal {100} Si etching condition for N2H4-H2O solutions and application to electrochemical etching

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Establishment of optimal {100} Si etching condition for N2H4-H2O solutions and application to electrochemical etching

Title: Establishment of optimal {100} Si etching condition for N2H4-H2O solutions and application to electrochemical etching

Authors: 주병권; 이윤희; 김형곤; 오명환

Issue Date: 1989-11

Publisher: 전자공학회 논문지

Citation: VOL 26, NO 11, 56-60

URI: https://pubs.kist.re.kr/handle/201004/9770

Appears in Collections:: KIST Publication > Article

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