Change of interfacial properties and trap density in amorphous InGaZnO thin film transistor depending on different rf power of sputtering

Authors
Kim, Bo SeulKim Do HyungLee Sang Yeol
Citation
7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics
URI
https://pubs.kist.re.kr/handle/201004/97959
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KIST Conference Paper > Others
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