KIST Library Institutional Repository

복합막형　기체　분리막　및　저온　플라즈마처리법에　의한　그의　제조방법

Author

김낙중; 김흥수; 박수영

Assignee

한국과학기술연구원

Regitration Date

1995-10-02

Registration No.

0089801

Application Date

1992-07-29

Application No.

1992-0013558

Country

KO

URI

https://pubs.kist.re.kr/handle/201004/99814

Appears in Collections:

KIST Patent > Others

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