선택성장법에 의한 고밀도 양자점 어레이 형성방법

Author
김성일박영균민석기김은규김춘근김용
Assignee
한국과학기술연구원
Regitration Date
1999-06-16
Registration No.
219837
Application Date
1997-02-21
Application No.
97-5290
Country
KO
URI
https://pubs.kist.re.kr/handle/201004/99931
Appears in Collections:
KIST Patent > Others
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