Showing results 1 to 5 of 5
Issue Date | Title | Author(s) |
---|---|---|
2021-04 | Copper-graphene heterostructure for back-end-of-line compatible high-performance interconnects | Son, Myungwoo; Jang, Jaewon; Lee, Yongsu; Nam, Jungtae; Hwang, Jun Yeon; Kim, In S.; Lee, Byoung Hun; Ham, Moon-Ho; Chee, Sang-Soo |
1999-07 | Effect of grain structure on the current-density exponent in the black equation for Al-alloy interconnects | Han, JH; Shin, MC; Kang, SH |
2001-05-25 | Electromigration-induced stress interaction between vias and polygranular clusters | Park, YJ; Joo, YC |
2002-02-01 | Electromigration-induced via failure assisted by neighboring clusters | Choi, IS; Park, YJ; Joo, YC |
1998-04-15 | Enhancement of selective chemical vapor deposition of copper by nitrogen plasma pretreatment | Kim, YS; Kim, DJ; Kwak, SK; Kim, EK; Min, SK; Jung, DG |