Browsing by Author 전법주

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Showing results 1 to 30 of 42

Issue DateTitleAuthor(s)
2005-01A study on effect of heat treatment on electrochemical characteristics of silicon-coated graphite이명로; 변동진; 전법주, et al
1997-08A study on the relation between film quality and deposition rate for amorphous silicon films grown by electron cyclotron resonance plasma chemical vapor deposition using H2/SiH4강문상; 김재영; 임태훈, et al
2008-01Adhesion characteristics of copper thin film deposited on PET substrate by electron cyclotron resonance-metal organic chemical vapor deposition전법주; 이상화; 이중기
1997-11Characteristics of a-Si:H films prepared by ECR CVD as a function of the H2/SiH4강문상; 김재영; 구용서, et al
1996-01Characteristics of a-Si:H films prepared by ECRPVD강문상; 임태훈; 오인환, et al
2005-07Characteristics of copper films on PET substrate deposited by cyclic operation of RF-magneteron-sputtering coupled with continous operation of ECR-CVD명종윤; 전법주; 변동진, et al
2003-09Characteristics of copper/C films on PET substrate prepared by ECR-MOCVD at room temperature.이중기; 전법주; 현진, et al
2002-10Characteristics of Cu/C films on polymer substrate by ECR chemical vapor deposition이중기; 전법주; 조병원, et al
2002-10Characteristics of Cu/C films on polymer substrate by ECR chemical vapor deposition이중기; 전법주; 조병원, et al
1996-01Characteristics of silicon oxide films prepared by chemical vapor deposition and dry oxidation method using ECR plasma sources.전법주; 허정수; 윤용수, et al
1997-07Characteristics of silicon oxide films prepared by chemical vapor deposition using ECR plasma source오인환; 전법주; 임태훈, et al
2005-02Characteristics of transparent conductive tin oxide thin films on PET substrate prepared by ECR-MOCVD김연석; 전법주; 주재백, et al
2008-05Effect of hydrogen content on the ZnO thin films on the surface of polyethylene terephthalate substrate through electron cyclotron resonance-metal organic chemical vapor deposition박지훈; 변동진; 전법주, et al
2004-10Effect of Pretreatment on the adhesion of copper film on PET substrate prepared by ECR-MOCVD coupled with a periodic DC bias전법주; 현진; 변동진, et al
1996-01Effect of silicon orientation on the electrical properties of SiO//2 using oxygen plasma.오인환; 임태훈; 허정수, et al
2004-03Effects of electrode configurations on uniformity of copper films on flexible polymer substrate prepared by ECR-MOCVD전법주; 이중기
2004-04Effects of Pretreatments of PET substrates on the adhesion of copper films prepared by a room temperature ECR-MOCVD method이중기; 전법주; 현진, et al
2004-01Effects of process parameters on the adhesion of copper film on polyethylene tetrephthalate(PET) substrate prepared by ECRMOCVD coupled with a periodic DC bias현진; 전법주; 변동진, et al
1997-06Effects on the oxidation rate with silicon orientation and its surface morphology전법주; 오인환; 임태훈, et al
1996-01Electrical characteristics of silicon oxide films prepared by chemical vapor deposition method using ECR plama sources.전법주; 허정수; 윤용수, et al
2004-12Electrochemica심흥택; 전법주; 변동진, et al
2005-11Electrochemical characteristics of copper silicide-coated graphite for the anode material of lithium secondary battery김인철; 변동진; 전법주, et al
2011-06Electrochemical characteristics of porous TiO2 encapsulated silicon anode전법주; 이중기
2016-06Employment of SnO2:F@Ni3Sn2/Ni nanoclusters composites as an anode material for lithium-ion batteries김민규; 김아영; 우재영, et al
2002-08Influence of the process parameters on the surface resistance of Cu/C films on polymer substrates prepared at ambient temperature by ECR-chemical vapor deposition.이중기; 전법주; 고형덕, et al
1996-01Low temperature preparation of SiO2 films with low interface trap density using diffusion and CVD method전법주; 임태훈; 오인환
2005-11Low temperature tin oxide thin film deposition on plastic substrate by ECR-MOCVD with ion beam assistance국윤호; V. Pukha; 변동진, et al
2015-01Plasma-polymerized C60 as a functionalized coating layer on fluorine-doped tin oxides for anode materials of lithium-ion batteries차이룰 후다야; 강봉조; 정훈기, et al
2014-11Polymer-templated C60/SnO2:F anode material for 3D lithium ion batteries차이룰 후다야; 마틴 할림; 이규하, et al
2010-06Preparation of Boron Doped Fullerene Film by a Thermal Evaporation Technique using Argon Plasma Treatment and Its Electrochemical Application아리; 전법주; 이중기

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