Low temperature tin oxide thin film deposition on plastic substrate by ECR-MOCVD with ion beam assistance

Authors
국윤호V. Pukha변동진전법주Lee, Joong Kee
Citation
ISE2005, pp.716
Keywords
tin oxide; deposition; ECR; MOCVD; ion beam
URI
https://pubs.kist.re.kr/handle/201004/104865
Appears in Collections:
KIST Conference Paper > Others
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