| 2001-04 | A method of improving dielectric constant and adhesion strength of methysilsesquioxyane by using a NH3 plasma treatment | 심현상; 김용태; 김동준, et al |
| 2003-10 | A new pulse plasma enhanced atomic layer deposition of tungsten nitride diffusion barrier for copper interconnect | 심현상; 김성일; 전형탁, et al |
| 1998-11 | Abnormal grain growth of niobium-doped strontium titanate ceramics | 배철휘; 박재관; 김윤호, et al |
| 2000-12 | Atomic-layer chemical-vapor-deposition of TiN thin films on Si(100) and Si(111) | 김영석; 전형탁; 김영도, et al |
| 2001-05 | Characteristic of tungsten nitride atomic layer deposition | 심현상; 김용태; 전형탁 |
| 2002-01 | Characteristics of plasma enhanced chemical vapor deposited W-B-N thin films | 김동준; 심현상; 김성일, et al |
| 2002-08 | Characteristics of pulse plasma enhanced atomic layer deposition of tungsten nitride diffusion barrier for copper interconnect | 심현상; 김용태; 전형탁 |
| 2002-02 | Characteristics of W-N diffusion barrier by atomic layer chemical vapor deposition | 심현상; 김용태; 전형탁 |
| 2002-01 | Comparison of TiN and TiAlN as a diffusion barrier deposited by atomic layer deposition | 김주영; 김효겸; 김양도, et al |
| 2016-12 | Correlation of nanostructure changes with the electrical properties of molybdenum disulfide (MoS2) as affected by sulfurization temperature | 이전국; 주현수; 오태경, et al |
| 2009-09 | Cyclopalladated azido complexes containing C,N-donor (HC~N = 2-(2'-thienyl)pyridine, azobenzene, 3,3'-dimethyl azobenzene, N,N'-dimethylbenzylamine, 2-phenylpyridine) ligands: reactivity towards organic unsaturated compounds and catalytic properties | 이경은; 전형탁; 한삼용, et al |
| 2000-06 | Digital deposition of tungsten nitride thin layer by cyclic exposure of WF//6 and NH₃ | 심현상; 김동준; 김용태, et al |
| 2000-01 | Digital deposition of tungsten nitride thin layer by sequential exposure of tung sten hexafluoride and ammonia | 심현상; 김동준; 김용태, et al |
| 2006-09 | Effect of Nanoscale Multilayered Structurization on Hardness and Wear Resistance of Ti-Al-Si-N Coatings | 조종영; 전형탁; 박종극, et al |
| 2007-11 | Effect of Nanostructure on the Hardness and Thermal Stability of Ti-Al-B-N Coating | 조종영; 전형탁; 박종극, et al |
| 2002-06 | Effects of NH₃ plasma treatment on methyl silsequioxane for copper multi-level interconnect | 심현상; 김용태; 전형탁 |
| 2015-05 | Fabrication of few-layer MoS2 by sputtering | 오태경; 민형섭; 전형탁, et al |
| 2015-10 | Fabrication of MoS2 few-layer by Off-axis sputtering | 오태경; 민형섭; 이교섭, et al |
| 2000-10 | Improvement in the characteristics of ammonia plasma treated MSQ(Methyl Silsesquioxane) | 심현상; 김동준; 김춘근, et al |
| 2003-11 | Improvement of W-N diffusion barrier on silicon dioxide using pulse plasma atomic layer deposition | 심현상; 전형탁; 김성일, et al |
| 2006-11 | Increase of Hardness and Thermal Stability of TiAlN coatings by Nanoscale Multilayered structurization with BN phase | 박종극; 조종영; 전형탁, et al |
| 2002-11 | Metalorganic atomic layer deposition of TiN Thim films using TDMAT and NH₃ | 김효경; 김주연; 박진용, et al |
| 1998-06 | Oxidation behavior at the interface between E-beam coated ZrO//2-7wt.%Y//2O//3 and plasma sprayed CoNiCrAlY | 최원섭; 김영도; 전형탁, et al |
| 2009-12 | Structure, hardness and thermal stability of TiAlBN coatings grown by alternating deposition of TiAlN and BN | 박종극; 조종영; 전형탁, et al |
| 2012-04 | Synergistic Interaction between Substrate and Seed Particles in Ultrathin Ultrananocrystalline Diamond Film Nucleation on SiO2 with Controlled Surface Termination | 이학주; 전형탁; 이욱성 |
| 2017-04 | Synthesis of large area MoS2 few layers by RF sputtering process | 이전국; 주현수; 오태경, et al |
| 1997-08 | The effect of Ti/Sr ratio on abnormal grain growth of Nb-doped SrTiO3 | 배철휘; 전형탁; 김윤호, et al |
| 1998-10 | The study of the estimation of fracture toughness in TBCs | 이재섭; 홍경태; 김영도, et al |
| 2011-01 | Ultrananocrystalline diamond film deposition by direct-current plasma assisted chemical vapor deposition using hydrogen-rich precursor gas in the absence of the positive column | 이학주; 전형탁; 이욱성 |
| 2011-10 | Ultrathin ultrananocrystalline diamond film synthesis by direct current plasma-assisted chemical vapor deposition | 이학주; 전형탁; 이욱성 |
