Browsing byAuthorPARK YOUNG JOON

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Showing results 1 to 15 of 15

Issue DateTitleAuthor(s)
-Abnormal grain growth in a liquid matrix.PARK YOUNG JOON; 윤덕용; Nong Moon Hwang
-Boron nitride films grown by low energy ion beam assisted depositionPARK YOUNG JOON; Baik Young Joon
-Effects of current wave forms and current densities on the electroplated Cu interconnection in damascene plating이유용; PARK YOUNG JOON; Cho Byung Won; 이재봉
-Electromigration-induced stress interaction between via and polygranular clusterPARK YOUNG JOON; 최인석; 주영창
-Heteroepitaxial growth of β -SiC using plasma activated methane and silane sources김홍석; PARK YOUNG JOON; 최인훈; EUN KWANG YONG; Baik Young Joon
-Interconnect failure mechanism maps for different metallization materials and processesV. K. Andleigh; PARK YOUNG JOON; C. V. Thompson
-Laser machining of chemical vapor deposited (CVD) diamond filmsPARK YOUNG JOON; Baik Young Joon; V. Ralchenko
-Nucleation behavior of diamond on (001) silicon substrate in alternating current biasing pretreatment김도근; PARK YOUNG JOON; 0; EUN KWANG YONG; Baik Young Joon
-Post-treatment induced resistivity changes of undoped diamond thin films이범주; PARK YOUNG JOON; 안병태; EUN KWANG YONG; Baik Young Joon
-Simulations of stress evolution and the current density scaling of electromigration-induced failure times in pure and alloyed interconnectsVaibhav K. Andleigh; PARK YOUNG JOON; Carl V. Thompson
-Stress effect on interconnect reliability due to electromigrationPARK YOUNG JOON; 주영창
-Temperature dependence of abnormal growth of faceted grains in a liquid matrix.PARK YOUNG JOON; 윤덕용; PARK CHAN WOO
-The effects of post annealing on the electrical characteristics of thin PECVD oxide.PARK YOUNG JOON; 노태문; 백종태; 남기수
-ULSI interconnect failures due to electromigration-induced stress evolution: computer simulation studyPARK YOUNG JOON; Vaibhav K. Andleigh; Carl V. Thompson; 최인석; 주영창
2001-10구리배선의 electromigration 신뢰성PARK YOUNG JOON

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