2013-01-25 | Effect of hydrogen addition on the residual stress of B-C-N films with cubic boron nitride phase prepared by r.f. magnetron sputtering of a B4C target | Park, Jong-Keuk; Ko, Ji-Sun; Baik, Young-Joon |
2012-11 | Effect of moisture in a vacuum chamber on the deposition of c-BN thin film using an unbalanced magnetron sputtering method | Lee, E.-S.; Park, J.-K.; Lee, W.-S.; Seong, T.-Y.; Baik, Y.-J. |
2013-05 | Insertion of nanocrystalline diamond film and the addition of hydrogen gas during deposition for adhesion improvement of cubic boron nitride thin film deposited by unbalanced magnetron sputtering method | Ko, Ji sun; PARK, JONG KEUK; Lee, Wook Seong; Huh, J. -Y.; Baik, Young Joon |
2021-12 | Nucleation retardation of cubic boron nitride films caused by the addition of oxygen in argon-nitrogen sputtering gas | Choi, Younghwan; Huh, J.-Y.; Baik, Young Joon |
2023-03 | Radial microstructural nonuniformity of boron nitride films deposited on a wafer scale substrate by unbalanced magnetron sputtering | Choi, Younghwan; J-Y. Huh; Baik, Young Joon |
1994-07 | Synthesis of cubic boron nitride from hexagonal boron nitride with AlMg alloy solvent under high pressures and high temperatures | Park, J.-K.; Park, S.-T.; Yong, Eun K. |
2013-05-25 | The parameter space of hydrogen content added to Ar-nitrogen sputtering gas and substrate bias voltage for the formation of cubic boron nitride thin film deposited by unbalanced magnetron sputtering method | Ko, J. -S.; Park, J. -K.; Lee, W. -S.; Baik, Y. -J. |
2011-09-01 | Variation of residual stress in cubic boron nitride film caused by hydrogen addition during unbalanced magnetron sputtering | Kim, H-S.; Park, J-K.; Lee, W-S.; Baik, Y-J. |
2007-04 | 입방정 질화붕소 박막의 잔류응력 형성에 미치는 산소 첨가 효과 | 장희연; 박종극; 이욱성; 백영준; 임대순; 정증현 |