The effect of heat treatments on the electron emission of amorphous carbon film deposited by RF magnetron sputtering method

Authors
Ju Byeong Kwon장윤택LEE YUN HIAHN JIN HOOH MYUNG HWAN
Citation
제 7 회 반도체 학술대회, pp.663 - 664
Keywords
field emission
URI
https://pubs.kist.re.kr/handle/201004/108892
Appears in Collections:
KIST Conference Paper > Others
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