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Alicyclic polymers based on t-BOC norbornene derivatives and maleic anhydride for applications as ArF photoresists

Authors

Ahn Kwang-Duk

Citation

2nd Asian Photochemistry Conference, pp.103 - 104

URI

https://pubs.kist.re.kr/handle/201004/109202

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KIST Conference Paper > Others

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