Reactive ion (N₂+) beam treatment of sapphire for GaN deposition

Authors
Kum Dong WhaByun Dongjin정재식KIM BYUNG HOKOH SEOK KEUNCHOI WON-KOOKPark Dal keun
Citation
The second International Conference on Nitride Semiconductors -ICNS'97-, P2-39, October 27-31, 1997,, pp.314 - ?
Keywords
reactive ion beam
URI
https://pubs.kist.re.kr/handle/201004/111190
Appears in Collections:
KIST Conference Paper > Others
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