Anisotropic surface morphology in a tensile-strained InAlAs layer grown on InP(100) substrates

Authors
Ju, Gun wuKim, HansungShim, Jae PhilKim, Seong KwangLee, Byeong-HyeonWon, Sung OkKim, SanghyeonKim, Hyung-jun
Issue Date
2018-03
Publisher
ELSEVIER SCIENCE SA
Citation
THIN SOLID FILMS, v.649, pp.38 - 42
Abstract
The anisotropic surface morphology of a tensile-strained In0.42Al0.58As layer grown on an InP(100) substrate was investigated by means of observing the cross-hatch patterns between two orthogonal in-plane directions: [011] and [0 (1) over bar1]. Analysis results using atomic force microscopy evidently reveal a higher array density along direction [011], with an asymmetrically sharp ridge across each array. Conversely, there was a much lower array density along direction [0 (1) over bar1] and a symmetrically big mound-like ridges. Our X-ray diffraction and energy-dispersive spectroscopy analyses showed a more substantial amount of strain relaxation along direction [0 (1) over bar1] due to preferential indium incorporation along [011]. As a result, the big mound ridges over the arrays along direction [0 (1) over bar1] were believed to be the result of local indium accumulation. Additionally, microcrack formations, penetrating into substrates, were exclusively formed on top of the mound ridges with central depressions along direction [0 (1) over bar1], presumably causing additional anisotropic strain relaxation.
Keywords
CROSS-HATCH SURFACE; GAAS 001; HETEROSTRUCTURES; DISLOCATION; INGAAS; EVOLUTION; SI(001); Epitaxial growth; III-V compound semiconductor; Cross-hatch array; Preferential surface diffusion; Microcrack; Anisotropic strain relaxation
ISSN
0040-6090
URI
https://pubs.kist.re.kr/handle/201004/121648
DOI
10.1016/j.tsf.2018.01.026
Appears in Collections:
KIST Article > 2018
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML

qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE