Anisotropic surface morphology in a tensile-strained InAlAs layer grown on InP(100) substrates
- Authors
- Ju, Gun wu; Kim, Hansung; Shim, Jae Phil; Kim, Seong Kwang; Lee, Byeong-Hyeon; Won, Sung Ok; Kim, Sanghyeon; Kim, Hyung-jun
- Issue Date
- 2018-03
- Publisher
- ELSEVIER SCIENCE SA
- Citation
- THIN SOLID FILMS, v.649, pp.38 - 42
- Abstract
- The anisotropic surface morphology of a tensile-strained In0.42Al0.58As layer grown on an InP(100) substrate was investigated by means of observing the cross-hatch patterns between two orthogonal in-plane directions: [011] and [0 (1) over bar1]. Analysis results using atomic force microscopy evidently reveal a higher array density along direction [011], with an asymmetrically sharp ridge across each array. Conversely, there was a much lower array density along direction [0 (1) over bar1] and a symmetrically big mound-like ridges. Our X-ray diffraction and energy-dispersive spectroscopy analyses showed a more substantial amount of strain relaxation along direction [0 (1) over bar1] due to preferential indium incorporation along [011]. As a result, the big mound ridges over the arrays along direction [0 (1) over bar1] were believed to be the result of local indium accumulation. Additionally, microcrack formations, penetrating into substrates, were exclusively formed on top of the mound ridges with central depressions along direction [0 (1) over bar1], presumably causing additional anisotropic strain relaxation.
- Keywords
- CROSS-HATCH SURFACE; GAAS 001; HETEROSTRUCTURES; DISLOCATION; INGAAS; EVOLUTION; SI(001); Epitaxial growth; III-V compound semiconductor; Cross-hatch array; Preferential surface diffusion; Microcrack; Anisotropic strain relaxation
- ISSN
- 0040-6090
- URI
- https://pubs.kist.re.kr/handle/201004/121648
- DOI
- 10.1016/j.tsf.2018.01.026
- Appears in Collections:
- KIST Article > 2018
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