Effect of p-GaN hole concentration on the stabilization and performance of a graphene current spreading layer in near-ultraviolet light-emitting diodes

Authors
Min, Jung-HongSeo, Tae HoonChoi, Sang-BaeKim, KiyoungLee, Jun-YeobPark, Mun-DoKim, Myung JongSuh, Eun-KyungKim, Jong-RyeolLee, Dong-Seon
Issue Date
2016-10
Publisher
ELSEVIER SCIENCE BV
Citation
CURRENT APPLIED PHYSICS, v.16, no.10, pp.1382 - 1387
Abstract
We have demonstrated the effect of p-GaN hole concentration on a graphene current spreading layer (CSL) for stabilization and improved performance of a near-ultraviolet light-emitting diode (NUV LED). While NUV LEDs with a more lightly-doped p-GaN showed poor electrical and optical properties and unstable performance, NUV LEDs with more heavily-doped p-GaN (similar to 2 x 10(17) cm(-3)) showed very stable, outstanding performance. The main factor of the improvement was the enhanced contact property between the graphene CSLs and the p-GaN that resulted from the increase of the hole concentration, which led to a thinner barrier and an enhanced current injection. From our results, we were able to determine that hole concentration as heavy as 2 x 10(17) cm(-3) in p-GaN layers is a primary condition in NUV LEDs with graphene-based CSLs. (C) 2016 Elsevier B.V. All rights reserved.
Keywords
p-GaN; Hole concentration; Graphene; Current spreading layer; Light-emitting diode
ISSN
1567-1739
URI
https://pubs.kist.re.kr/handle/201004/123599
DOI
10.1016/j.cap.2016.08.006
Appears in Collections:
KIST Article > 2016
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