Nanosecond switching in GeSe phase change memory films by atomic force microscopy

Authors
Bosse, James L.Grishin, IlyaChoi, Yong GyuCheong, Byung-kiLee, SuyounKolosov, Oleg V.Huey, Bryan D.
Issue Date
2014-02-03
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.104, no.5
Abstract
Nanosecond scale threshold switching is investigated with conducting atomic force microscopy (AFM) for an amorphous GeSe film. Switched bits exhibit 2-3 orders of magnitude variations in conductivity, as demonstrated in phase change based memory devices. Through the nm-scale AFM probe, this crystallization was achieved with pulse durations of as low as 15 ns, the fastest reported with scanning probe based methods. Conductance AFM imaging of the switched bits further reveals correlations between the switched volume, pulse amplitude, and pulse duration. The influence of film heterogeneities on switching is also directly detected, which is of tremendous importance for optimal device performance. (C) 2014 AIP Publishing LLC.
Keywords
CHANGE MEDIA; GE2SB2TE5; CRYSTALLIZATION; SILICON; CHANGE MEDIA; GE2SB2TE5; CRYSTALLIZATION; SILICON; GeSe; nanosecond switching; phase change memory; atomic force microscopy
ISSN
0003-6951
URI
https://pubs.kist.re.kr/handle/201004/127107
DOI
10.1063/1.4863495
Appears in Collections:
KIST Article > 2014
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