Nanosecond switching in GeSe phase change memory films by atomic force microscopy
- Authors
- Bosse, James L.; Grishin, Ilya; Choi, Yong Gyu; Cheong, Byung-ki; Lee, Suyoun; Kolosov, Oleg V.; Huey, Bryan D.
- Issue Date
- 2014-02-03
- Publisher
- AMER INST PHYSICS
- Citation
- APPLIED PHYSICS LETTERS, v.104, no.5
- Abstract
- Nanosecond scale threshold switching is investigated with conducting atomic force microscopy (AFM) for an amorphous GeSe film. Switched bits exhibit 2-3 orders of magnitude variations in conductivity, as demonstrated in phase change based memory devices. Through the nm-scale AFM probe, this crystallization was achieved with pulse durations of as low as 15 ns, the fastest reported with scanning probe based methods. Conductance AFM imaging of the switched bits further reveals correlations between the switched volume, pulse amplitude, and pulse duration. The influence of film heterogeneities on switching is also directly detected, which is of tremendous importance for optimal device performance. (C) 2014 AIP Publishing LLC.
- Keywords
- CHANGE MEDIA; GE2SB2TE5; CRYSTALLIZATION; SILICON; CHANGE MEDIA; GE2SB2TE5; CRYSTALLIZATION; SILICON; GeSe; nanosecond switching; phase change memory; atomic force microscopy
- ISSN
- 0003-6951
- URI
- https://pubs.kist.re.kr/handle/201004/127107
- DOI
- 10.1063/1.4863495
- Appears in Collections:
- KIST Article > 2014
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