Low voltage operating InGaZnO4 thin film transistors using high-k MgO-Ba0.6Sr0.4TiO3 composite gate dielectric on plastic substrate

Authors
Kim, Dong HunCho, Nam GyuKim, Ho-GiKim, Hyun-SukHong, Jae-MinKim, Il-Doo
Issue Date
2008-07-21
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v.93, no.3
Abstract
The authors report on the dielectric and leakage current properties of room temperature grown MgO-Ba0.6Sr0.4TiO3 (MgO-BST) composite thin films to be utilized InGaZnO4 thin films transistors (TFTs) fabricated on a polyethylene terephthalate (PET) substrate. The InGaZnO4 TFTs with MgO-BST gate dielectrics exhibited low operation voltage of 4 V, high on/off current ratio of 4.13x10(6), and high field effect mobility of 10.86 cm(2)/V s. These results verify that a room temperature grown MgO-BST gate dielectric is a good candidate for producing high performance InGaZnO4 TFTs on plastic substrates. (C) 2008 American Institute of Physics.
Keywords
AMORPHOUS OXIDE SEMICONDUCTORS; AMORPHOUS OXIDE SEMICONDUCTORS
ISSN
0003-6951
URI
https://pubs.kist.re.kr/handle/201004/133313
DOI
10.1063/1.2954014
Appears in Collections:
KIST Article > 2008
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