Low voltage operating InGaZnO4 thin film transistors using high-k MgO-Ba0.6Sr0.4TiO3 composite gate dielectric on plastic substrate
- Authors
- Kim, Dong Hun; Cho, Nam Gyu; Kim, Ho-Gi; Kim, Hyun-Suk; Hong, Jae-Min; Kim, Il-Doo
- Issue Date
- 2008-07-21
- Publisher
- AMER INST PHYSICS
- Citation
- APPLIED PHYSICS LETTERS, v.93, no.3
- Abstract
- The authors report on the dielectric and leakage current properties of room temperature grown MgO-Ba0.6Sr0.4TiO3 (MgO-BST) composite thin films to be utilized InGaZnO4 thin films transistors (TFTs) fabricated on a polyethylene terephthalate (PET) substrate. The InGaZnO4 TFTs with MgO-BST gate dielectrics exhibited low operation voltage of 4 V, high on/off current ratio of 4.13x10(6), and high field effect mobility of 10.86 cm(2)/V s. These results verify that a room temperature grown MgO-BST gate dielectric is a good candidate for producing high performance InGaZnO4 TFTs on plastic substrates. (C) 2008 American Institute of Physics.
- Keywords
- AMORPHOUS OXIDE SEMICONDUCTORS; AMORPHOUS OXIDE SEMICONDUCTORS
- ISSN
- 0003-6951
- URI
- https://pubs.kist.re.kr/handle/201004/133313
- DOI
- 10.1063/1.2954014
- Appears in Collections:
- KIST Article > 2008
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