Strained InGaAs(P)/InP multi-quantum well structures grown by chemical-beam epitaxy

Authors
Woo, DHOh, MSKoh, EHYahng, JSKim, SHKim, YD
Issue Date
2000-05
Publisher
ELSEVIER SCIENCE BV
Citation
MICROELECTRONIC ENGINEERING, v.51-2, pp.171 - 179
Abstract
We have carried out a double-crystal X-ray diffraction (DCXRD) study on ternary In1-xGaxAs/InP and quaternary In1-xGaxAsyP1-y/InP strained multi-quantum well (MQW) structures on (001) InP substrates grown by chemical beam epitaxy. The presence of well-defined higher-order harmonics in the DCXRD results and also the presence of intense and sharp peaks in the low- and room-temperature photoluminescence measurements confirm the high quality of strained MQW structures. This is further supported by the observation of defect-foe interfaces in transmission electron microscope photographs. By comparing the DCXRD measurements with X-ray simulation results, we could obtain layer thicknesses and profiles of perpendicular strains relative to the InP barrier. (C) 2000 Elsevier Science B.V. All rights reserved.
Keywords
X-RAY-DIFFRACTION; INTRINSIC STRAIN; SUPERLATTICES; CBE; INTERFACES; X-RAY-DIFFRACTION; INTRINSIC STRAIN; SUPERLATTICES; CBE; INTERFACES; strained layer; InGaAsP; CBE; DCXRD
ISSN
0167-9317
URI
https://pubs.kist.re.kr/handle/201004/141433
DOI
10.1016/S0167-9317(99)00470-0
Appears in Collections:
KIST Article > 2000
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