Thermal stabilities of PECVD W-B-N thin films as a diffusion barrier.

Authors
김용태김동준이창우박종완
Issue Date
1997-10
Citation
Multilevel interconnect technology (SPIE)., v.v. 3214, pp.48 - 56
Keywords
thermal stability
URI
https://pubs.kist.re.kr/handle/201004/143561
Appears in Collections:
KIST Article > Others
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