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Electrical property of TiO2 dielectric thin films grown on n-type InP(100) substrates by low-pressure MOCVD

Other Titles

저압 MOCVD법으로 n형 InP 위에 성장시킨 TiO2 유전체박막의 전기적 특성

Authors

김은규; 손맹호; 한영기; 왕채현; 염상섭; 임종수; 민석기

Issue Date

1995-11

Citation

응용물리, v.8, no.6, pp.630 - 634

Keywords

low pressure MOCVD; thin films; TiO2; InP; MOCVD

ISSN

1013-7009

URI

https://pubs.kist.re.kr/handle/201004/144931

Appears in Collections:

KIST Article > Others

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