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Stress relaxation in plasma deposited tungsten nitride/tungsten bilayer.

Authors

김용태; 이창우

Issue Date

1994-01

Citation

Appl. phys. lett., v.v. 65, no.no. 8, pp.965 - 967

URI

https://pubs.kist.re.kr/handle/201004/145706

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KIST Article > Others

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