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Growth of g-Al2O3 thin films on Si by low-pressure metalorganic chemical vapor deposition

Authors

염상섭; 윤영수; W. N. Kang; J. I. Lee; D. J. Choi; T. W. Kim; K. Y. Seo; P. H. Hur; C. Y. Kim

Issue Date

1992-01

Citation

Thin solid films, v.213, pp.72 - 75

Keywords

thin films; Al2O3; MOCVD

URI

https://pubs.kist.re.kr/handle/201004/146632

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KIST Article > Others

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