KIST Library Institutional Repository

Effect of flow rate ratios of SiH//4/NH//3/N//2 and SiH//4/NH//3/Ar on the properties of PECVD SiN//x:H films.

Authors

김용태; 김춘근; 민석기

Issue Date

1988-01

Citation

J. Kor. inst. telem. elec., v.v. 25, pp.490 - 494

URI

https://pubs.kist.re.kr/handle/201004/147637

Appears in Collections:

KIST Article > Others

Files in This Item:

There are no files associated with this item.

Export

RIS (EndNote)

XLS (Excel)

XML