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Nitrogen ion mixed tungsten thin films for metal-organic chemical vapor deposited Cu metallization.

Other Titles: Nitrogen ion mixed tungsten thin films for metal-organic chemical vapor deposited Cu metallization.

Authors: Kim Yong Tae; 이창우

Issue Date: 1995-01

URI: https://pubs.kist.re.kr/handle/201004/148891

Appears in Collections:: KIST Publication > Others

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