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기재 위에 h-BN 후막을 형성하는 방법 및 그로부터 제조된 h-BN 후막 적층체

Author

김수민; 김기강; 손장엽; 이승기; 이주송

Assignee

한국과학기술연구원

Regitration Date

2016-12-05

Registration No.

10-1685100

Application Date

2015-03-27

Application No.

10-2015-0043309

Country

KO

URI

https://pubs.kist.re.kr/handle/201004/83376

Appears in Collections:

KIST Patent > 2015

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