기재 위에 h-BN 후막을 형성하는 방법 및 그로부터 제조된 h-BN 후막 적층체

Author
김수민김기강손장엽이승기이주송
Assignee
한국과학기술연구원
Regitration Date
2016-12-05
Registration No.
10-1685100
Application Date
2015-03-27
Application No.
10-2015-0043309
Country
KO
URI
https://pubs.kist.re.kr/handle/201004/83376
Appears in Collections:
KIST Patent > 2015
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