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Effect of reactive gas of fluorides on Si etching by using ICP-RIE

Other Titles

ICP-RIE를 이용한 실리콘 식각에 미치는 플루오르계 반응 가스의 영향

Authors

Sang-Heon Kim; Jung, Sung Mok; Kim, Young-Hwan

Citation

한국진공학회 제34회 정기학술대회, pp.246

Keywords

실리콘 나노선; ICP-RIE; 수직 식각

URI

https://pubs.kist.re.kr/handle/201004/98396

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KIST Conference Paper > Others

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