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Showing results 5 to 7 of 7

Issue DateTitleAuthor(s)
1996-01Study of temperature dependent conductivity of Ta, Ta-Si-N thin films.Kim Yong Tae; S. P. Jeong; D. J. Kim; H. N. Lee; Min Suk-Ki
-The properties of nitrogen implanted tungsten diffusion barrier for Cu metallization.Kim Yong Tae; C. S. Kwon; D. J. Kim; J. Y. Lee; I. H. Choi
1995-01The properties of nitrogen implanted tungsten diffusion barrier for Cu metallization.김용태; C. S. Kwon; D. J. Kim; J. Y. Lee; I. H. Choi
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