Effect of Substrate Bias and Hydrogen Addition on the Residual Stress of Hexagonal Boron Nitride Film Prepared by Sputtering of B4C Target with Ar/N2 Reactive Gas

Authors
JONG-KEUK, PARKLeeJungHoonLee, Wook SeongBaik, Young Joon
Citation
ICMCTF2013
URI
https://pubs.kist.re.kr/handle/201004/93976
Appears in Collections:
KIST Conference Paper > Others
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