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Effect of Substrate Bias and Hydrogen Addition on the Residual Stress of Hexagonal Boron Nitride Film Prepared by Sputtering of B4C Target with Ar/N2 Reactive Gas

Authors

JONG-KEUK, PARK; LeeJungHoon; Lee, Wook Seong; Baik, Young Joon

Citation

ICMCTF2013

URI

https://pubs.kist.re.kr/handle/201004/93976

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KIST Conference Paper > Others

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