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Showing results 1 to 4 of 4

Issue DateTitleAuthor(s)
-Enhancement of Reconstructed Image by Noise Reduction for Mask Inspection of EUVL (Extreme Ultra-Violet Light) LithographyCho Jung-gyn; Cho Sung-jin; Park, Min-Chul; Jhon, Young Min; Byeong-Kwon Ju; Jung-Young Son
2010-03Evaluation on over photocurrents measured from unmasked dye-sensitized solar cellsLee, Gi-Won; Kim, Donghwan; Ko, Min Jae; Kim, Kyungkon; Park, Nam-Gyu
2010-10-04High-Resolution, Parallel Patterning of Nanoparticles via an Ion-Induced Focusing MaskYou, Sukbeom; Han, Kyuhee; Kim, Hyoungchul; Lee, Heechul; Woo, Chang Gyu; Jeong, Changui; Nam, Woongsik; Choi, Mansoo
-Image Compensation of Mask Misalignment in Aerial Image Microscope SystemPark, Min-Chul; Jhon, Young Min; Kim, Yong Tae

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