Showing results 1 to 4 of 4
Issue Date | Title | Author(s) |
---|---|---|
- | Enhancement of Reconstructed Image by Noise Reduction for Mask Inspection of EUVL (Extreme Ultra-Violet Light) Lithography | Cho Jung-gyn; Cho Sung-jin; Park, Min-Chul; Jhon, Young Min; Byeong-Kwon Ju; Jung-Young Son |
2010-03 | Evaluation on over photocurrents measured from unmasked dye-sensitized solar cells | Lee, Gi-Won; Kim, Donghwan; Ko, Min Jae; Kim, Kyungkon; Park, Nam-Gyu |
2010-10-04 | High-Resolution, Parallel Patterning of Nanoparticles via an Ion-Induced Focusing Mask | You, Sukbeom; Han, Kyuhee; Kim, Hyoungchul; Lee, Heechul; Woo, Chang Gyu; Jeong, Changui; Nam, Woongsik; Choi, Mansoo |
- | Image Compensation of Mask Misalignment in Aerial Image Microscope System | Park, Min-Chul; Jhon, Young Min; Kim, Yong Tae |